Fast, Consistent Solenoid for Atomic Layer Deposition
客户问题
Atomic layer deposition (ALD) films are applied in uniform, thin layers with atomic-level, repeatable control and complete conformity. A pulse of inert gas separates each dose of reactive chemicals, purging the chamber in preparation for the next application. The deposition process required a solution that could operate quickly through the cycles, under maximum pressure and temperature, while maintaining consistency over an extended life (>100 million cycles).
TLX 解决方案
The ALD application cycle requires multiple doses of reactive chemicals to be delivered sequentially into the processing chamber. TLX developed a two-position, three-way pilot valve with performance tailored for ALD applications, including ultra-fast response, high operating temperature and compact design. The component used minimal power, making it more cost-effective than competing designs.
XX Atomic Layer Deposition Pilot Valve
- Operating voltage
- 12 to 30 Vdc
- Operating pressure range
- 0 to 500 kPa
- Operating temperature
- -40 to 200°C
- Operating frequency
- 100-300 Hz
- Resistance
- 48 +/- 4.8 ohms @ 20°C
- Inductance
- 68.6 mH
- Flow Rate
- 35 l/min @ 80 kPa
- Leak Rate
- < 2 cc/min
- PWM pressure control
- 10-90% duty cycle
- PWM vacuum control
- 10-90% duty cycle
- Response time
- < 6 ms
- Burst pressure
- 50 bar
- Vibration
- 20 G
TLX提供的任何组件，均可根据客户的不同系统、技术参数等要求进行设计和定制。本网站上的示例仅供说明目的。